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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Pattern decomposition and process integration of self-aligned double patterning for 30nm node NAND FLASH process and beyond
Chang, Yi-Shiang, Levinson, Harry J., Dusa, Mircea V., Tsai, Meng-Feng, Lin, Chia-Chi, Lai, Jun-ChengVolume:
7274
Year:
2009
Language:
english
DOI:
10.1117/12.814000
File:
PDF, 803 KB
english, 2009