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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - C-quad polarized illumination for back end thin wire: moving beyond annular illumination regime
Mehta, Sohan S., Levinson, Harry J., Dusa, Mircea V., Lee, Hyung-Rae, Hamieh, Bassem, Kallingal, Chidam, Matthew, Itty, Viswanathan, Ramya, Dunn, Derren N.Volume:
7274
Year:
2009
Language:
english
DOI:
10.1117/12.814296
File:
PDF, 9.31 MB
english, 2009