SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Top coat less resist process development for contact layer of 40nm node logic devices
Fujita, Masafumi, Allen, Robert D., Uchiyama, Takayuki, Furusho, Tetsunari, Otsuka, Takahisa, Tsuchiya, KatsuhiroVolume:
7639
Year:
2010
Language:
english
DOI:
10.1117/12.846270
File:
PDF, 1.59 MB
english, 2010