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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Measuring resist-induced contrast loss using EUV interference lithography
La Fontaine, Bruno M., Langner, Andreas, Solak, Harun H., Gronheid, Roel, van Setten, Eelco, Auzelyte, Vaida, Ekinci, Yasin, van Ingen Schenau, Koen, Feenstra, KeesVolume:
7636
Year:
2010
Language:
english
DOI:
10.1117/12.846495
File:
PDF, 1.91 MB
english, 2010