SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Gas-based spectral filter for mitigating 10.6 μm radiation in CO 2 laser produced plasma extreme ultraviolet sources
Mbanaso, Chimaobi, La Fontaine, Bruno M., Naulleau, Patrick P., Denbeaux, Gregory, Antohe, Alin, Bull, Horace, Goodwin, Frank, Hershcovitch, AdyVolume:
7969
Year:
2011
Language:
english
DOI:
10.1117/12.879550
File:
PDF, 621 KB
english, 2011