SPIE Proceedings [SPIE SPIE Optical Systems Design - Marseille, France (Monday 5 September 2011)] Physical Optics - Numerical optimization of illumination and mask layout for the enlargement of process windows and for the control of photoresist profiles in proximity printing
Motzek, Kristian, Smith, Daniel G., Wyrowski, Frank, Partel, Stefan, Vogler, Uwe, Erdmann, Andreas, Erdmann, AndreasVolume:
8171
Year:
2011
Language:
english
DOI:
10.1117/12.896755
File:
PDF, 3.02 MB
english, 2011