SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Design for Manufacturability through Design-Process Integration VI - In-design hierarchical DFM closure for DFM-clean IP
Tripathi, Vikas, Subramanian, Jayathi, Sharma, Puneet, Chen, Kuang-Han, Kasthuri, Bala, Hurat, Philippe, Layton, Larry, Mason, Mark E.Volume:
8327
Year:
2012
Language:
english
DOI:
10.1117/12.916219
File:
PDF, 24.13 MB
english, 2012