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SPIE Proceedings [SPIE Photomask Japan '94 - Kawasaki City, Kanagawa, Japan (Friday 22 April 1994)] Photomask and X-Ray Mask Technology - Silicon shaping mask for electron-beam cell projection lithography
Satoh, Hidetoshi, Nakayama, Yoshinori, Saitou, Norio, Kagami, T., Yoshihara, HideoVolume:
2254
Year:
1994
Language:
english
DOI:
10.1117/12.191922
File:
PDF, 515 KB
english, 1994