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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - High order wafer alignment for 20nm node logic process
Jeon, Bumhwan, Pal, Shyam, Mehta, Sohan, Lokesh, Subramany, Jiang, Yun Tao, Li, Chen, Yelverton, Mark, Wei, Yayi, Starikov, Alexander, Cain, Jason P.Volume:
8681
Year:
2013
Language:
english
DOI:
10.1117/12.2010709
File:
PDF, 369 KB
english, 2013