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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - Dry development rinse process (DDRP) and material (DDRM) for novel pattern collapse free process
Sakamoto, Rikimaru, Sakaida, Yasushi, Ho, Bang-Ching, Somervell, Mark H.Volume:
8682
Year:
2013
Language:
english
DOI:
10.1117/12.2011511
File:
PDF, 1.28 MB
english, 2013