![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - Modeling of optical alignment and metrology schemes used in integrated circuit manufacturing
Yuan, Chi-Min, Strojwas, Andrzej J., Pol, VictorVolume:
1264
Year:
1990
Language:
english
DOI:
10.1117/12.20189
File:
PDF, 789 KB
english, 1990