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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XX - Yokohama, Japan (Tuesday 16 April 2013)] Photomask and Next-Generation Lithography Mask Technology XX - Better numerical model for shape-dependent dose margin correction using model-based mask data preparation
Kimura, Yasuki, Kubota, Takao, Kouno, Kenji, Hagiwara, Kazuyuki, Matsushita, Shohei, Hara, Daisuke, Kato, KokoroVolume:
8701
Year:
2013
Language:
english
DOI:
10.1117/12.2028333
File:
PDF, 391 KB
english, 2013