SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Photosensitization in dyed and undyed APEX-E DUV resist
Sturtevant, John L., Conley, Will, Webber, Stephen E., Kunz, Roderick R.Volume:
2724
Year:
1996
Language:
english
DOI:
10.1117/12.241825
File:
PDF, 573 KB
english, 1996