SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Application of DNQ-based microlithography to patterning bioactive molecules and cells
Nicolau, Dan V., Taguchi, Takahisa, Taniguchi, Hiroshi, Yoshikawa, Susumu, Dusa, Mircea V., Kunz, Roderick R.Volume:
2724
Year:
1996
Language:
english
DOI:
10.1117/12.241848
File:
PDF, 905 KB
english, 1996