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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Metrology, Inspection, and Process Control for Microlithography XII - Elimination of bottom-pinching effect in environmentally stable chemically amplified resists
Soo, Choi P., Fan, Ming H., Bourdillon, Antony J., Chan, Lap H., Singh, BhanwarVolume:
3332
Year:
1998
Language:
english
DOI:
10.1117/12.308790
File:
PDF, 1.38 MB
english, 1998