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SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Optical Microlithography XI - Intrafield critical dimension variation using KrF scanner system for 0.18-μm lithography
Yim, Donggyu, Kim, Hyeong-Soo, Baik, Ki-Ho, Van den Hove, LucVolume:
3334
Year:
1998
Language:
english
DOI:
10.1117/12.310813
File:
PDF, 2.06 MB
english, 1998