![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Polymers for 157-nm photoresist applications: a progress report
Patterson, Kyle, Yamachika, Mikio, Hung, Raymond J., Brodsky, Colin J., Yamada, Shintaro, Somervell, Mark H., Osborn, Brian, Hall, Daniel S., Dukovic, Gordana, Byers, Jeff D., Conley, Will, Willson, CVolume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388320
File:
PDF, 1.40 MB
english, 2000