SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VII - Kanagawa, Japan (Wednesday 12 April 2000)] Photomask and Next-Generation Lithography Mask Technology VII - Pattern shape analysis tool for defect judgement of photomask
Matsuo, Fuyuhiko, Otaki, Masao, Fukugami, Norihito, Yonekura, Isao, Fukushima, Yuhichi, Morimoto, HiroakiVolume:
4066
Year:
2000
Language:
english
DOI:
10.1117/12.392036
File:
PDF, 4.80 MB
english, 2000