SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - Application of advanced 100-kV EB writer EB-X3 for 100-nm node x-ray mask fabrication
Watanabe, Hiroshi, Nakayama, Yoshinori, Tsuboi, Shinji, Ezaki, Mizunori, Aoyama, Hajime, Matsui, Yasuji, Morosawa, Tetsuo, Oda, Masatoshi, Dobisz, Elizabeth A.Volume:
4343
Year:
2001
Language:
english
DOI:
10.1117/12.436670
File:
PDF, 571 KB
english, 2001