SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA...

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SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Evaluation of various alternating phase shifting mask processes for KrF lithography

Yoon, Si-Yeul, Cha, Han-Sun, Choi, Se-Jong, Jung, Sung-Mo, Choi, Sang-Soo, Jeong, Soo-Hong, Dao, Giang T., Grenon, Brian J.
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Volume:
4562
Year:
2002
Language:
english
DOI:
10.1117/12.458266
File:
PDF, 580 KB
english, 2002
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