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SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Aerial image-based inspection of binary (OPC) and embedded-attenuated PSM
Chang, Felix, Hung, Chang-Cheng, Lin, John C., Rosenbusch, Anja, Falah, Reuven, Hemar, Shirley, Grenon, Brian J., Kimmel, Kurt R.Volume:
4889
Year:
2002
Language:
english
DOI:
10.1117/12.467767
File:
PDF, 244 KB
english, 2002