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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Novel bilayer resist approach using radiation sensitive organometalics precursors
Jeyakumar, Augustin, Barstow, Sean J., Henderson, Clifford L., Fedynyshyn, Theodore H.Volume:
4690
Year:
2002
Language:
english
DOI:
10.1117/12.474179
File:
PDF, 312 KB
english, 2002