SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 8 September 2003)] 23rd Annual BACUS Symposium on Photomask Technology - Photomask repair performance of the SiON/Ta-Hf attenuating PSM
Nishiguchi, Masaharu, Amano, Tsuyoshi, Sasaki, Shiho, Morikawa, Yasutaka, Hayashi, Naoya, Kimmel, Kurt R., Staud, WolfgangVolume:
5256
Year:
2003
Language:
english
DOI:
10.1117/12.518038
File:
PDF, 413 KB
english, 2003