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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Airborne contamination control for 157-nm lithography: influence of ammonia contamination
Matsui, Hidefumi, Sturtevant, John L., Kitano, Junichi, Yoshihara, Kosuke, Kawaguchi, Etsurou, Furukawa, Takamitsu, Matsunaga, Kentaro, Itani, Toshiro, Fujii, KiyoshiVolume:
5376
Year:
2004
Language:
english
DOI:
10.1117/12.534975
File:
PDF, 2.65 MB
english, 2004