SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Optical metrology for 193-nm immersion objective characterization
Aronstein, David, Smith, Bruce W., Bentley, Julie, Dewa, Paul G., Dunn, Michael, Schreiber, Horst, Nguyen, Thanh, Webb, James E.Volume:
5377
Year:
2004
Language:
english
DOI:
10.1117/12.536383
File:
PDF, 261 KB
english, 2004