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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - The analysis of the criteria of phase error by evaluating the influence of lens aberration on the lithographic performance
Jeong, Chang-Young, Smith, Bruce W., Ahn, Jun-Kyu, Park, Ki-Yeop, Choi, Jae S., Lee, Jeong G.Volume:
5754
Year:
2005
Language:
english
DOI:
10.1117/12.600418
File:
PDF, 416 KB
english, 2005