SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - 193nm dual layer organic BARCs for high NA immersion lithography
Abdallah, David J., Sturtevant, John L., Neisser, Mark, Dammel, Ralph R., Pawlowski, Georg, Ding, S., Houlihan, Francis M., Romano, Andrew R., Biafore, J. J., Raub, AlexVolume:
5753
Year:
2005
Language:
english
DOI:
10.1117/12.600736
File:
PDF, 1.29 MB
english, 2005