SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - Immersion specific defect mechanisms: findings and recommendations for their control
Kocsis, Michael, Flagello, Donis G., Van Den Heuvel, Dieter, Gronheid, Roel, Maenhoudt, Mireille, Vangoidsenhoven, Dizana, Wells, Greg, Stepanenko, Nickolay, Benndorf, Michael, Kim, Hyun Woo, KishimurVolume:
6154
Year:
2006
Language:
english
DOI:
10.1117/12.660432
File:
PDF, 825 KB
english, 2006