SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - The design and qualification of the TEL CLEAN TRACK ACT TM M photomask coating tool at Intel
Jamieson, Andrew, Hoga, Morihisa, Dam, Thuc, Baik, Ki-Ho, Duerksen, Ken, Eidson, Elie, Akai, Keiji, Hisano, Kazuya, Kohama, Norifumi, Machidori, ShinichiVolume:
6283
Year:
2006
Language:
english
DOI:
10.1117/12.681751
File:
PDF, 354 KB
english, 2006