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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Illumination optimization with actual information of exposure tool and resist process
Tsujita, Koichiro, Flagello, Donis G., Mikami, Koji, Naka, Ryotaro, Baba, Norikazu, Ono, Tomomi, Suzuki, AkiyoshiVolume:
6520
Year:
2007
Language:
english
DOI:
10.1117/12.711048
File:
PDF, 774 KB
english, 2007