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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Multilayer BARCs for hyper-NA immersion lithography process
Sakaida, Yasushi, Lin, Qinghuang, Takei, Satoshi, Nakajima, Makoto, Kimura, Shigeo, Sakaguchi, Takahiro, Hashimoto, Keisuke, Imamura, HikaruVolume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.711382
File:
PDF, 486 KB
english, 2007