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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - The optimization of photoresist profile for sub-90nm technology
Jeon, Haengleem, Archie, Chas N., Shim, Cheonman, Hong, Jiho, Han, Jaewon, Kim, KeehoVolume:
6518
Year:
2007
Language:
english
DOI:
10.1117/12.711965
File:
PDF, 600 KB
english, 2007