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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Design for Manufacturability through Design-Process Integration - Statistical analysis of gate CD variation for yield optimization
Holwill, Juliet, Wong, Alfred K. K., Singh, Vivek K., Kye, Jongwook, Zou, YiVolume:
6521
Year:
2007
Language:
english
DOI:
10.1117/12.712178
File:
PDF, 422 KB
english, 2007