SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Improvements of adhesion and hydrophobicity of wafer bevel in water immersion lithography
Henderson, Clifford L., Ishibash, Takeo, Terai, Mamoru, Hagiwara, Takuya, Kumada, Teruhiko, Hanawa, Tetsuro, Takebe, Yoko, Yokokoji, Osamu, Fujiwara, Tomoharu, Akiyama, HiroshiVolume:
6923
Year:
2008
Language:
english
DOI:
10.1117/12.771794
File:
PDF, 324 KB
english, 2008