SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Modeling mask scattered field at oblique incidence
Tawfik, Tamer M., Levinson, Harry J., Dusa, Mircea V., Morshed, Ahmed H., Khalil, DiaaVolume:
7274
Year:
2009
Language:
english
DOI:
10.1117/12.814018
File:
PDF, 610 KB
english, 2009