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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - Improvement of simulation accuracy using a non Gaussian kernel
Futatsuya, Hiroki, Hosono, Kunihiro, Yamamoto, Tomohiko, Yoshikawa, Satoshi, Chijimatsu, Tatsuo, Asai, SatoruVolume:
7379
Year:
2009
Language:
english
DOI:
10.1117/12.830611
File:
PDF, 312 KB
english, 2009