SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - New exposure tool management technology with quick focus measurement in half pitch 22nm generation
Fukazawa, Kazuhiko, Raymond, Christopher J., Kitamura, Toshiaki, Takeda, Shinsuke, Fujimori, Yoshihiko, Kudo, Yuji, Hirukawa, Shigeru, Takemasa, Kengo, Kasai, Noriaki, Yamazaki, Yuuichiro, Yoshino, KiVolume:
7638
Year:
2010
Language:
english
DOI:
10.1117/12.846329
File:
PDF, 3.06 MB
english, 2010