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SPIE Proceedings [SPIE International Conference on Micro- and Nano-Electronics 2009 - Zvenigorod, Russian Federation (Monday 5 October 2009)] International Conference on Micro- and Nano-Electronics 2009 - Application of Langmuir probe technique in depositing plasmas for monitoring of etch process robustness and for end-point detection
Miakonkikh, Andrey V., Valiev, Kamil A., Orlikovsky, Alexander A., Rudenko, Konstantin V.Volume:
7521
Year:
2009
Language:
english
DOI:
10.1117/12.853840
File:
PDF, 271 KB
english, 2009