![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - E-beam writing time improvement for inverse lithography technology mask for full-chip
Xiao, Guangming, Hosono, Kunihiro, Son, Dong Hwan, Cecil, Tom, Irby, Dave, Kim, David, Baik, Ki-Ho, Kim, Byung-Gook, Jung, SungGon, Suh, Sung Soo, Cho, HanKuVolume:
7748
Year:
2010
Language:
english
DOI:
10.1117/12.867995
File:
PDF, 347 KB
english, 2010