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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - Tunable resin reactivity of spin-on dielectric by controlling synthesis process
Han, Kwen Woo, Song, Hyun-Ji, Kim, Mi-Young, Park, Eun Su, Yoon, Hui Chan, Kim, Go Eun, Lim, Sang Hak, Kim, Sang Kyun, Somervell, Mark H., Wallow, Thomas I.Volume:
8325
Year:
2012
Language:
english
DOI:
10.1117/12.916252
File:
PDF, 1.81 MB
english, 2012