SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Design for Manufacturability through Design-Process Integration VI - Self-aligned double and quadruple patterning layout principle
Nakayama, Koichi, Kodama, Chikaaki, Kotani, Toshiya, Nojima, Shigeki, Mimotogi, Shoji, Miyamoto, Shinji, Mason, Mark E.Volume:
8327
Year:
2012
Language:
english
DOI:
10.1117/12.916678
File:
PDF, 2.09 MB
english, 2012