SPIE Proceedings [SPIE 1986 Microlithography Conferences - Santa Clara (Monday 10 March 1986)] Electron-Beam, X-Ray, and Ion-Beam Technology for Submicrometer Lithographies V - The Nanofab-150-A Versatile New Focused-Ion-Beam System
Parker, N.William, Robinson, William P., Snyder, Joseph M., Blais, Phillip D.Volume:
632
Year:
1986
Language:
english
DOI:
10.1117/12.963671
File:
PDF, 4.71 MB
english, 1986