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SPIE Proceedings [SPIE 1988 Microlithography Conferences - Santa Clara, CA (Wednesday 2 March 1988)] Advances in Resist Technology and Processing V - A Novel Silicon-Containing Resist For A Bi-Layer Resist System
Noguchi, Tsutomu, Nito, Keiichi, Seto, Jun'etsu, Hata, Izumi, Sato, Hiroshi, Tsumori, Toshirou, MacDonald, Scott A.Volume:
920
Year:
1988
Language:
english
DOI:
10.1117/12.968316
File:
PDF, 6.64 MB
english, 1988