SPIE Proceedings [SPIE 13th Annual BACUS Symposium on Photomask Technology and Management - Santa Clara, CA (Wednesday 22 September 1993)] 13th Annual BACUS Symposium on Photomask Technology and Management - Printability of phase-shift defects using a perturbational model
Socha, Robert J., Neureuther, Andrew R., Grady, Edward C., Moneta, Jack P.Volume:
2087
Year:
1994
Language:
english
DOI:
10.1117/12.167269
File:
PDF, 674 KB
english, 1994