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SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Integrated Circuit Metrology, Inspection, and Process Control VIII - Low-loss electron imaging and its application to critical dimension metrology
Monahan, Kevin M., Davidson, M., Grycz, Zofia, Krieger, Royce, Scheumaker, B., Zmrzli, Robert, Bennett, Marylyn H.Volume:
2196
Year:
1994
Language:
english
DOI:
10.1117/12.174122
File:
PDF, 308 KB
english, 1994