SPIE Proceedings [SPIE Photomask Japan '94 - Kawasaki City, Kanagawa, Japan (Friday 22 April 1994)] Photomask and X-Ray Mask Technology - Sub-half-micrometer lithography mask metrology: matching of the optical and mask system
Dusa, Mircea V., Rauch, Erik H., Yoshihara, HideoVolume:
2254
Year:
1994
Language:
english
DOI:
10.1117/12.191947
File:
PDF, 807 KB
english, 1994