SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Characterization of the intermediate development bake as applied to I-line lithography
Samarakone, Nandasiri, Jaenen, Patrick, Van den Hove, Luc, Hurditch, Rodney J., Watts, Michael P. C.Volume:
1262
Year:
1990
Language:
english
DOI:
10.1117/12.20117
File:
PDF, 1018 KB
english, 1990