SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 16 September 2014)] Photomask Technology 2014 - Intra-field CDU map correlation between SEMs and aerial image characterization
Ackmann, Paul W., Hayashi, Naoya, Ning, Guoxiang, Philipp, Peter, Litt, Lloyd C., Meusemann, Stefan, Thaler, Thomas, Schulz, Kristian, Tschinkl, Martin, Ackmann, PaulVolume:
9235
Year:
2014
Language:
english
DOI:
10.1117/12.2066173
File:
PDF, 716 KB
english, 2014