![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Negative resists for electron-beam lithography utilizing acid-catalyzed intramolecular dehydration of phenylcarbinol
Migitaka, Sonoko, Uchino, Shou-ichi, Ueno, Takumi, Yamamoto, Jiro, Kojima, Kyoko, Hashimoto, Michiaki, Shiraishi, Hiroshi, Kunz, Roderick R.Volume:
2724
Year:
1996
Language:
english
DOI:
10.1117/12.241859
File:
PDF, 379 KB
english, 1996