![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microelectronic Manufacturing Technologies - Edinburgh, United Kingdom (Wednesday 19 May 1999)] Lithography for Semiconductor Manufacturing - Effect of reticle manufacturing quality on full chip optical proximity correction
Martin, Brian, Arthur, Graham G., Mack, Chris A., Stevenson, TomVolume:
3741
Year:
1999
Language:
english
DOI:
10.1117/12.346894
File:
PDF, 194 KB
english, 1999